Nanoimprint lithography is a next generation lithography technology, which enables to fabricate
nano to micron-scale patterns through simple and low cost process. Nanoimprint lithography has
been applied in various industry fields such as light emitting diodes, solar cells and display.
Functional patterns, including anti-reflection moth-eye pattern, photonic crystal pattern, fabricated
by nanoimprint lithography are used to improve overall efficiency of devices in that fields. For
these reasons, in this study, sub-micron-scaled functional patterns were directly fabricated on Si
and glass substrates by thermal imprinting process using ZnO nano-partlcles dispersion resin.
Through the thermal imprinting process, arrays of sub-micron-scaled pillar and hole patterns were
successfully fabricated on the Si and glass substrates. And then, the topography, components
and optical property of the imprinted ZnO nano-particles/resin patterns are characterized by
Scanning Electron Microscope, Energy-dispersive X-ray spectroscopy and UV-vis spectrometer,
respectively.