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Title Page

ABSTRACT

Contents

Chapter 1. Introduction 26

1.1. Ultrafast Camera: Pump-Probe Technique 26

1.2. Ultrafast X-ray Diffraction 28

1.3. Ultrafast Electron Diffraction 29

Chapter 2. Current Status of Ultrashort Pulse Development: X-ray and Electron 33

2.1. Ultrashort X-ray Pulse Generation 33

2.1.1. High Harmonics Generation (HHG) 34

2.1.2. Laser Driven Plasma (LDP) 35

2.1.3. Free Electron Laser 35

2.2. Ultrashort Electron Pulse Generation 36

2.2.1. Compact Electron Gun 36

2.2.2. Single-Electron Pulses 37

2.2.3. MeV Ultrafast Electron Microscope 38

2.2.4. KeV Ultrafast Electron Microscope 39

2.3. Radiation effects induced by X-rays and electrons 39

Chapter 3. Beam Dynamics in High-Brightness Pulsed Electron Beam-line 42

3.1. Electron Beam Phase Space Evolution 43

3.1.1. Brightness and Emittance 43

3.1.2. Phase Space Evolution along Electron Optics Systems 46

3.1.3. Imaging and Aberrations 50

3.2. Phase Space Evolution in High-Brightness Pulsed Electron Beam System 54

Chapter 4. Design of High-Brightness UEM Electron Beam Line at Michigan State University 60

4.1. Electron Source: Pierce Geometry DC Photoelectron Gun 64

4.2. Magnetic Lenses 70

4.3. Radio-frequency (RF) Cavity 82

4.3.1. RF Field in Pillbox Cavity 83

4.3.2. RF Cavity in High-Brightness Electron Beam Line 86

4.3.3. RF Station for RF Field and Electron Pulse Synchronization 88

4.4. Charge-coupled Device (CCD) Camera 91

4.5. Other Components for Optical and Electron Beam Delivery 93

4.5.1. 266 nm Excitation Mirror Holder and Electron Beam Shield 94

4.5.2. Electron Beam Deflector 95

4.5.3. Aperture Manipulator 96

4.6. The Ultra High Vacuum(UHV) Chamber 99

Chapter 5. Characterization of The Electron Beam System 102

5.1. 100 kV Pierce Geometry Electron Source 103

5.1.1. Measurement Procedure for Electron Beam Current 103

5.1.2. Electron Beam Current Measurement Results 110

5.1.3. Pepper Pot Technique for Emittance Measurement 113

5.1.4. Beam Emittance Measurement 117

5.2. Magnetic Lens Focusing Characterization 122

5.3. Phase Jitter of RF Compression 125

5.4. Performance Projection for UED Experiment 129

Chapter 6. Further Development of Ultrafast Electron Diffractive Voltammetry 133

6.1. Introduction 133

6.2. Origins of Transient Photoinduced Surface Voltage 134

6.3. Surface Diffraction and Rocking Map Characterization 136

6.4. The General Formalism of Electron Diffractive Voltammetry 140

6.5. Ultrafast Electron Diffractive Voltammetry Experiment: Photoemission Contribution 144

6.6. Near Surface Field Induced by Photoemission 149

6.7. Modeling of The Surface Photovoltammetry 152

6.8. Surface Photovoltage 155

6.9. Summary 160

Chapter 7. Photo-Induced Charge Carrier Dynamics at Nanostructured Interfaces 162

7.1. Surface Charging of Pure SiO₂/Si Interface 164

7.2. Surface Charging of Au Nanoparticle Decorated Si/SiO₂ Surface 169

7.3. Photo-induced Field Enhancement with Localized Surface Plasmon of Nanostructures 174

7.3.1. Localized Surface Plasmon of Gold Nanoparticles 175

7.3.2. Localized Surface Plasmon of Hollow Gold Nano-shell 179

7.3.3. Surface Plasmon Mediated Charge Dynamics of Au Nanoparticle Decorated SiO₂/Si Interface 181

7.3.4. Plasmon Mediated Spectral Hole Burning of Hollow Gold Nano-shell on Si/SiO₂ Surface 184

7.4. Summary 191

Chapter 8. Preliminary Experiment with High-Brightness Electron Beam System 192

8.1. Shadow Imaging and Beam Alignment 192

8.2. Convergent Beam 194

8.3. RF Compression of High-Brightness Electron Beam: VO₂ 197

Chapter 9. Summary and Outlook 207

APPENDICES 209

Appendix A. Diffraction Theory for Ultrafast Electron Diffraction 210

Appendix B. Experiment Setup of Ultrafast Electron Diffraction 222

Appendix C. Formalism of diffracted voltammetry under small angle condition 234

Appendix D. Magnetic Annealing Procedure 238

Appendix E. Optimization of Pierce Geometry Electron Gun 239

Appendix F. List of Initials and Acronyms 242

BIBLIOGRAPHY 244

List of Tables

Table 2.1. Comparison among X-ray sources 34

Table 2.2. Energy deposited in biological specimens 40

Table 4.1. The location of the optical components in the high-brightness UED column 82

Table 4.2. Aperture Position 99

Table 5.1. Electron dose D=Ne/A with CML1=1.0 A and Obj.ML=1.3 A[이미지참조] 129

Table 5.2. Comparison of the electron dose among different high-flux UED source 131

Table 8.1. The electron beam properties with different conditions 195

List of Figures

Figure 1.1. Schematic diagram of the pump-probe experiment setup. The relative time delay... 27

Figure 1.2. (a) Time-dependent diffracted intensity for (220) reflections. Red curves are... 28

Figure 1.3. Angular shift of (111) gold Bragg peak as a function of delay time from the same... 30

Figure 1.4. The melting dynamics of 2 nm Au nanoparticles. (Left) mRDF map constructed... 31

Figure 3.1. Schematic illustration of a transfer matrix in a trace space: Left side is an initial... 47

Figure 3.2. Schematic illustration of electron beam dynamics in drift/magnetic lens/drift... 48

Figure 3.3. Schemtic illustration of an image system with one lens. 51

Figure 3.4. The 6D emittance εxεyεz vs. the number of emitted electrons Nemit for the...[이미지참조] 58

Figure 4.1. RF-enabled high-brightness ultrafast electron beam system at Michigan State University 61

Figure 4.2. (a) Photoelectron pulse trajectory along an ultrafast electron beam column... 63

Figure 4.3. Cathode and anode of Pierce geometry photoelectron gun: (a) electric field cal-... 65

Figure 4.4. Pierce geometry photoelectron gun head assembly: (a) Fully assembled Pierce... 66

Figure 4.5. Pierce geometry photoelectron gun: (a) the whole Pierce photoelectron gun... 68

Figure 4.6. Current stability monitor (a) after the electron gun conditioning, (b) before the conditioning 71

Figure 4.7. Schematic illustration of non-uniform magnetic field (red lines) at the center... 72

Figure 4.8. Condenser magnetic lens No. 1: (a) The geometry of the lens. The yellow... 73

Figure 4.9. Condenser magnetic lens No. 2: (a) The geometry of the lens. The yellow... 74

Figure 4.10. Objective magnetic lens: (a) The geometry of the lens. The yellow box region... 75

Figure 4.11. (a) Magnetic lens current calibration simulation: Solid lines are AGM simulation... 78

Figure 4.12. Field Precision simulation of an electron trajectory with non-interacting par-... 80

Figure 4.13. Pillbox cavity with radius R and length d: (a) illustration of the pillbox ge-... 83

Figure 4.14. RF cavity: (a) The actual design of geometry optimized RF cavity and the... 87

Figure 4.15. Block diagram of the Phase lock loop. 89

Figure 4.16. Structure of charge coupled device (CCD) camera mount. (a) Schematic il-... 92

Figure 4.17. 266 nm excitation mirror holder and electron beam shield. 94

Figure 4.18. Electron beam deflector. (a) The design of the electron beam deflector: the... 97

Figure 4.19. Aperture manipulator. (a) Stereoscan 360 scanning electron microscope aper-... 98

Figure 4.20. Schematic diagram of the high-brightness UED chambers: (1) the 100 kV... 100

Figure 5.1. Schematic illustration of Faraday cup: To prevent the escape of an elastic scat-... 104

Figure 5.2. Single electron count events of attenuated electron beam on CCD camera. The... 106

Figure 5.3. (a) The probability profile of the integrated intensity of single-electron events.... 108

Figure 5.4. (a) The design of the beam trap. The copper tubing outer diameter is 2.0 mm... 109

Figure 5.5. The number of emitted electrons per pulse. (a) Simulation results of the number... 112

Figure 5.6. Illustration of the emittance measurement sheme 115

Figure 5.7. Electron beam image and profile on the CCD camera. (a) is a image of the full... 118

Figure 5.8. Electron beam trace space plot (x,x') of 10 electron per pulse and 106 electron...[이미지참조] 119

Figure 5.9. Dependence of the transverse emittance εx on the number of emitted electrons...[이미지참조] 120

Figure 5.10. (a) Schematic illustration for the beam propagation along the electron column... 123

Figure 5.11. Comparison between Field Precision trajectory simulation and experiment. (a)... 124

Figure 5.12. Schematic illustration of the phase jitter. (a) Perfect phase match between... 126

Figure 5.13. Beam size and energy variation of electron pulse with different relative phase... 128

Figure 6.1. Transient photoinduced charge redistribution near surface. (a) The three mech-... 134

Figure 6.2. Surface electron diffraction pattern in different conditions. (a) Ewald sphere... 137

Figure 6.3. The idealized slab model for considering the transient surface voltage. The top... 141

Figure 6.4. The refraction-induced shift (△B) for diffraction peak located at θO at VS=1...[이미지참조] 143

Figure 6.5. Shadow imaging experiment to characterize the properties of photoemission. (a)... 147

Figure 6.6. N-particle shadow projection imaging simulation at two different time delays. 148

Figure 6.7. Experiments to characterize photoelectron dynamics and surface photovoltage... 150

Figure 6.8. (a) An effective circuit model depicting the transient surface voltage VS(t) mea-...[이미지참조] 153

Figure 6.9. Theoretical modeling of transient surface voltage VS(t). Using RC time of 30.8ps,...[이미지참조] 156

Figure 6.10. Transient surface voltage caused purely by △DP. △PE contribution is sub-... 158

Figure 7.1. Charge redistribution at nanomaterials interfaces subject to photoexcitation. (a)... 163

Figure 7.2. Trasient voltammetry from three diffracted beams from Si/SiO₂ interface, (a)... 167

Figure 7.3. (a) A sample of Au nanoparticles (NPs) immobilized on a functionalized Si... 171

Figure 7.4. (a) An effective circuit model depicting the transient surface voltage VS(t) mea-...[이미지참조] 172

Figure 7.5. Schematic illustration of localized surface plasmon oscillation induced by an oscil-... 175

Figure 7.6. Hollow gold nanoshell (HGN) surface plasmon resonance, (a) Schematic illus-... 180

Figure 7.7. An energy diagram of plasmon hybridization in a HGN describes the interaction... 182

Figure 7.8. Ultrafast transport at gold nanoparticle (NP)/SAM/silicon interface near surface... 183

Figure 7.9. (a) The statistics of HGNs diameter before fs laser irradiation and after irra-... 185

Figure 7.10. (a) Debye-Waller factor(DWF) analysis of the diffraction intensity drop. This... 189

Figure 8.1. CeTe₃ sample image on 1000 mesh TEM grid: (a) optical microscope image, (b)... 193

Figure 8.2. Convergent beam test to maximize the electron dose Ne/A. With the constant...[이미지참조] 196

Figure 8.3. (a) Convergent beam diffraction of TaS₂ with 50 μm aperture (exposure time 500... 198

Figure 8.4. (a) Crystal structure of VO₂ in metallic rutile phase: the gray ball is the V... 199

Figure 8.5. (a) Optical microscope image of VO₂ film sample which is grown on the 5 nm... 201

Figure 8.6. The photo-induced phase transition measurement with VO₂ with different RF... 203

Figure 8.7. Pulse duration measurement from VO₂ phase transition: VO₂ phase transition...[이미지참조] 204

Figure 8.8. (a) Electron pulse arriving time fluctuation during the experiment. Zero fluctu-... 206

Figure A.1. Different kinds of electrons scattering from the specimen 211

Figure A.2. Derivation of Bragg equation 2dsinθ=nλ 213

Figure A.3. The phase angle difference of incident beam is k.r=2πsinφ/λ and the path... 216

Figure A.4. Ewald sphere construction: The points are reciprocal lattice points of the crystal.... 218

Figure B.1. Ultrafast electron diffraction experiment geometry with ultrafast electron mi-... 223

Figure B.2. Schematic picture of the femtosecond laser source: (1) femtosecond seed pulse... 224

Figure B.3. Universal electron gun design. (a) Zoom-in of the electron gun head part,... 227

Figure B.4. Performance characterization of the 40 kV universal electron gun. (a) Analog-to-... 229

Figure B.5. Structure of charge coupled device (CCD) camera design. (a) Schematic illus-... 232

Figure E.1. (a) Schematic illustration of a non-interacting photoemission electron genera-... 240

초록보기

To make a 'molecular movie', an 'ultrafast camera' with simultaneously very high spatial and temporal resolution to match the atomic dynamics is required. The ultrafast electron diffraction (UED) technique based on femtosecond laser technology can provide a basic framework for realizing such an 'ultrafast camera' although this technology has not achieved its full utility as a universal imaging and spectroscopy tool, due to limitations in generation and preservation of a high-brightness electron beam in the ultrafast regime.

With moderate electron pulse intensity (10³-10⁴ electrons per pulse), UED experiments have been successfully applied to investigate photo-induced non-thermal melting processes, structural phase transitions, and transient surface charge dynamics. Based on the previous development of ultrafast electron diffractive voltammetry (UEDV), we extend the UEDV with an aim to identify the different constituents of the measured transient surface voltage (TSV) and discuss their respective roles in Coulomb refraction. From applying this methodology on Si/SiO₂ interface and surfaces decorated with nano-structures, we are able to elucidate localized charge injection, dielectric relaxation, carrier diffusion, and enhancements on such processes through surface plasmon resonances, with direct resolution in the charge state and possibly correlated structural dynamics at these interfaces. These new results highlight the high sensitivity of the interfacial charge transfer to the nanoscale modification, environment, and surface plasmonics enhancement and demonstrate the diffraction-based ultrafast surface voltage probe as a unique method to resolve the nanometer scale charge carrier dynamics.

The future applications of the UED and UEDV techniques lie in the direct visualization and site-selected studies such as nano-structured interfaces, a single nanoparticle or domain, which can be enabled by the development of high-brightness ultrafast electron beam system for ultrafast electron diffraction. To realize the high-brightness beam, we have developed a high-brightness ultrafast electron beam column equipped with a 100 keV Pierce photoelectron gun and an RF compressor. We are able to generate up to ~5x106 electron per pulse, and, more importantly with the capability of micro-focusing, we have achieved a high dose delivery to the sample by three orders of magnitude (up to ~2000 electron/㎛2) higher than those of conventional UED electron systems. In this high intensity pulsed electron beam system, the major challenge is overcoming strong Coulomb repulsion among electrons (space-charge effect) in the pulse, because the space-charge effect causes the electron pulse expansion in transverse and longitudinal direction. To correct the space-charge effect, we have implemented the magnetic lenses for transverse focusing of the electron pulse, and radio frequency (RF) cavity for longitudinal recompression of the pulse. Such a system will provide enough flexibility to manipulate electron pulse phase space, so various experiments that require high spatial and temporal coherence and/or high-density beam optimized for microdiffraction can be achieved.