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소장정보 검색

국회도서관 홈으로 정보검색 소장정보 검색
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초록보기

As a radio frequency (RF) power and plasma process monitoring sensor, a voltage current (VI) probe has been utilized and developed to monitor and optimize plasma processes in semiconductor fabrication. However, many components are needed to deliver the RF power from the power supply to the plasma electrodes such as an RF connector and RF cable which affect the RF power transmission efficiency. Therefore, it is necessary to analyze the characteristics of RF power transmission lines with respect to the external parameter configuration using a VI probe. In this study, we investigated the characteristics of RF signals using a VI probe for various RF power transmission lines, including the VI probe installation position, RF connector type, and RF cable length. The RF signals were measured as a function of the input power in a lowpressure argon discharge. Consequently, the RF power loss was significant when long RF cables were used for the transmission line. Analyzing the characteristics of RF transmission lines using a VI probe can improve the reliability of RF measurement properties for plasma processing applications.

권호기사

권호기사 목록 테이블로 기사명, 저자명, 페이지, 원문, 기사목차 순으로 되어있습니다.
기사명 저자명 페이지 원문 목차
Dielectric characteristics of BaTiO3 solid solution substituted with Nb5+, Ta5+, Bi3+, and Sb3+ ions Yeon Jung Kim p. 101-105
Machine learning-based prediction of atomic layer control for MoS2 via reactive ion etcher Changmin Kim, Seunghwan Lee, Muyoung Kim, Min Sup Choi, Taesung Kim, Hyeong-U Kim p. 106-109
Enhancement of light-harvesting ability on perovskite films via preheated substrates Jaewon Oh, Hyunbok Lee, Mee-Yi Ryu p. 110-113
Spectroscopic analysis of effects of additive nitrogen on atmospheric pressure Ar/HMDS plasma Jonggu Han, Rodolphe Mauchauffé, Se Youn Moon p. 114-117
Analysis of the characteristics of radio frequency power transmission lines using a voltage current probe in low-pressure discharge Chan-Won Park, Hee-Jung Yeom, Hyo-Chang Lee, Jung-Hyung Kim p. 118-121
Deep learning predicts Ar/O2 plasma in inductively coupled plasma discharge Sang-Bin Lee, Ji-Hoon Kim, Gwan Kim, Jun-Woo Park, Byung-Kwan Chae, Hee-Hwan Choe p. 122-126
Computational study on the parallel double-curling probe for multi-site electron density measurement in low-temperature plasma Si-Jun Kim, Won-Nyoung Jeong, Young-Seok Lee, You-Bin Seol, Chul-Hee Cho, In-Ho Seong, Min-Su Choi, Shin-Jae You p. 127-133

참고문헌 (20건) : 자료제공( 네이버학술정보 )

참고문헌 목록에 대한 테이블로 번호, 참고문헌, 국회도서관 소장유무로 구성되어 있습니다.
번호 참고문헌 국회도서관 소장유무
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2 D. Choi et al., Plasma Sources Sci. Technol. 27, 114002 (2018). 미소장
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7 N. Cahoon, P. Srinivasan, and F. Guarin, Proceedings of the 2022IEEE International Reliability Physics Symposium (Dallas, USA, March 27-31, 2022), 11B11-11B19. 미소장
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9 S.-H. Shin, H.-T. Noh, D.-I. Kim, Y.-K. Park, and S.-S. Han, ECS Trans. 60, 875 (2014). 미소장
10 H. Jang, H.-S. Lee, H. Lee, and H. Chae, Appl. Sci. Converg. Technol. 23, 328 (2014). 미소장
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15 M. Mahreen, A. Ganguli, V.P. Gajula, S. Kar, and D. Sahu, Rev. Sci. Instrum. 93, 123514 (2022). 미소장
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20 Y. Liu, Y. Liu, and M. G. B. Drew, Phys. Scr. 97, 015806 (2022). 미소장

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