| 1 |
Oxides Which Show a Metal-to-Insulator Transition at the Neel Temperature  |
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| 2 |
Temperature dependence of the first-order metal-insulator transition in VO2 and programmable critical temperature sensor  |
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| 3 |
Evidence of a pressure-induced metallization process in monoclinic VO2.  |
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| 4 |
Phase transformation and semiconductor-metal transition in thin films of VO2 deposited by low-pressure metalorganic chemical vapor deposition  |
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| 5 |
Electrochemistry of conductive polymers  |
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| 6 |
Summary Abstract: Reactive ion etching of vanadium dioxide thin films  |
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| 7 |
M.S. Kim, (2008) On the etching mechanism of ZrO2 thin films in inductively coupled BCl3/Ar plasma, Microelecton. Eng |
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| 8 |
Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition  |
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| 9 |
R. March, (2005) Quadrupole ion trap mass spectrometry, John Wiley & Sons, Inc. |
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| 10 |
Optical emission spectroscopy of reactive plasmas: A method for correlating emission intensities to reactive particle density  |
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| 11 |
R. Payling, (2002) Optical Emission Lines of the Elements, John Wiley & Sons Ltd. |
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| 12 |
J.F. Moulder, (1995) Handbook of X-ray Photoelectron Spectroscopy, Physical Electronics, Inc. |
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| 13 |
M. Köhler, (1999) Etching in Microsystem Technology, WILEY-VCH |
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